High quality thermochromic VO2 thin films deposited at room temperature by balanced and unbalanced HiPIMS

In this paper, vanadium dioxide thin films were successfully deposited at room temperature by high power impulse magnetron sputtering (HiPIMS) using two different configurations: (i) a conventional balanced and (ii) an unbalanced magnetron. the case of magnetron, magnetic field is extended towards substrate energetic ions in plasma actively participate film growth allowing to improve crystallinity. The as-deposited annealed under Ar flow for 1 h obtain thermochromic VO2(M) phase. 120 nm first characterized X-ray diffraction (XRD). Then, behavior VO2 was investigated electrical optical characterizations. effect annealing on properties studied showing that quality can be obtained 300 °C HiPIMS. A very efficient change transmittance exceeding 70% observed IR spectral region. This investigation demonstrates capability HiPIMS achieve performances lower as well potential technology deposition onto temperature-sensitive substrates.